The critical thickness formula typically refers to the critical thickness of a thin film for a given material system. This critical thickness is the maximum thickness below which the film remains coherent and above which it becomes strained or even fragmented due to lattice mismatch or other factors.
The critical thickness () can be calculated using the following formula:
Where:
- is unitless
- is in meters (m)
- is unitless
- is unitless
- = critical thickness in m
This formula is commonly used in materials science and semiconductor engineering to understand the behavior of thin films grown on substrates.